Beilstein J. Nanotechnol.2019,10, 1125–1130, doi:10.3762/bjnano.10.112
. The hysteresis after negative-bias-illumination-stress (NBIS) is quantitatively investigated by using the double-scan mode and a positive gate pulse. Despite the abnormal transfer properties in the low-temperature-treated device, the excited holes are identically trapped at the front interface
the backlight for non-emissive displays. The degradation of oxide-based TFTs under this kind of negative-bias-illumination-stress (NBIS) is a key issue that has been investigated over the last decade [6][7]. Despite all efforts to unveil the mechanisms of NBIS, such as first-principles calculations
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Figure 1:
Transfer characteristics of the devices annealed at different temperatures.
Beilstein J. Nanotechnol.2018,9, 2573–2580, doi:10.3762/bjnano.9.239
and illuminationstress (NBIS)-induced instability in amorphous InGaZnO thin-film transistors (a-IGZO TFTs) with various active layer thicknesses (TIGZO) were investigated. The photoleakage current was found to gradually increase in a-IGZO TFTs irrespective of the TIGZO when the photon energy of
.
Keywords: active layer thickness; gate bias; illuminationstress; InGaZnO; photoleakage current; thin-film transistors; Introduction
Over the last decade, the amorphous oxide-based semiconductor thin-film transistors (AOS TFTs) have attracted global attention for use in advanced display technologies due
electrons are excited from the trapped states existing near the valence band (EV). In addition, the a-IGZO TFTs inevitably suffer electrical and optical stresses during practical operation conditions, especially for the negative bias and illuminationstress (NBIS) tests [11][12][13][14][15][16], which leads
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Figure 1:
(a) Schematic cross-sectional view and (b) the initial transfer characteristics of a-IGZO TFTs with...